Kinetic Monte Carlo simulations of nucleation and growth in electrodeposition

Lian Guo; Aleksandar Radisic; Peter C. Searson

doi:10.1021/jp055077u

Kinetic Monte Carlo simulations of nucleation and growth in electrodeposition

Lian Guo, Aleksandar Radisic, Peter C. Searson

Research output: Contribution to journal › Article › peer-review

Abstract

Nucleation and growth during bulk electrodeposition is studied using kinetic Monte Carlo (KMC) simulations. Ion transport in solution is modeled using Brownian dynamics, and the kinetics of nucleation and growth are dependent on the probabilities of metal-on-substrate and metal-on-metal deposition. Using this approach, we make no assumptions about the nucleation rate, island density, or island distribution. The influence of the attachment probabilities and concentration on the time-dependent island density and current transients is reported. Various models have been assessed by recovering the nucleation rate and island density from the current-time transients.

Original language	English (US)
Pages (from-to)	24008-24015
Number of pages	8
Journal	Journal of Physical Chemistry B
Volume	109
Issue number	50
DOIs	https://doi.org/10.1021/jp055077u
State	Published - Dec 22 2005
Externally published	Yes

ASJC Scopus subject areas

Physical and Theoretical Chemistry
Surfaces, Coatings and Films
Materials Chemistry

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abstract = "Nucleation and growth during bulk electrodeposition is studied using kinetic Monte Carlo (KMC) simulations. Ion transport in solution is modeled using Brownian dynamics, and the kinetics of nucleation and growth are dependent on the probabilities of metal-on-substrate and metal-on-metal deposition. Using this approach, we make no assumptions about the nucleation rate, island density, or island distribution. The influence of the attachment probabilities and concentration on the time-dependent island density and current transients is reported. Various models have been assessed by recovering the nucleation rate and island density from the current-time transients.",

author = "Lian Guo and Aleksandar Radisic and Searson, {Peter C.}",

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AU - Guo, Lian

AU - Radisic, Aleksandar

AU - Searson, Peter C.

PY - 2005/12/22

Y1 - 2005/12/22

N2 - Nucleation and growth during bulk electrodeposition is studied using kinetic Monte Carlo (KMC) simulations. Ion transport in solution is modeled using Brownian dynamics, and the kinetics of nucleation and growth are dependent on the probabilities of metal-on-substrate and metal-on-metal deposition. Using this approach, we make no assumptions about the nucleation rate, island density, or island distribution. The influence of the attachment probabilities and concentration on the time-dependent island density and current transients is reported. Various models have been assessed by recovering the nucleation rate and island density from the current-time transients.

AB - Nucleation and growth during bulk electrodeposition is studied using kinetic Monte Carlo (KMC) simulations. Ion transport in solution is modeled using Brownian dynamics, and the kinetics of nucleation and growth are dependent on the probabilities of metal-on-substrate and metal-on-metal deposition. Using this approach, we make no assumptions about the nucleation rate, island density, or island distribution. The influence of the attachment probabilities and concentration on the time-dependent island density and current transients is reported. Various models have been assessed by recovering the nucleation rate and island density from the current-time transients.

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JF - Journal of Physical Chemistry B

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Kinetic Monte Carlo simulations of nucleation and growth in electrodeposition

Abstract

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