Forming electrically conductive interconnects between nanowires using solder reflow

Zhiyong Gu, Hongke Ye, Thomas Yu, Adam Bernfeld, David H. Gracias

Research output: Contribution to conferencePaperpeer-review

Abstract

In this paper we describe the utilization of solder reflow to form electrically conductive interconnects between nanowires-nanowires and nanowires-substrates. The nanowires that range in diameter from 30 nm to 200 nm are fabricated using electrodeposition in nanoporous templates. Reflowed solder joints are characterized using electron microscopy and electrical probe testing. We will describe the integration of nanowires to form elementary electrical devices such as an AC integrator.

Original languageEnglish (US)
Pages11316
Number of pages1
StatePublished - 2005
Event05AIChE: 2005 AIChE Annual Meeting and Fall Showcase - Cincinnati, OH, United States
Duration: Oct 30 2005Nov 4 2005

Other

Other05AIChE: 2005 AIChE Annual Meeting and Fall Showcase
Country/TerritoryUnited States
CityCincinnati, OH
Period10/30/0511/4/05

ASJC Scopus subject areas

  • General Engineering

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