Dependence of carrier lifetime and resistivity on annealing in InP grown by He-plasma-assisted molecular beam epitaxy

Jin U. Kang, Michael Y. Frankel, Ronald D. Esman, D. A. Thompson, B. J. Robinson

Research output: Contribution to journalArticlepeer-review

Abstract

We have experimentally investigated the carrier lifetime and resistivity versus anneal temperature in InP films grown by He-plasma-assisted molecular beam epitaxy. This material is shown to exhibit picosecond carrier lifetime with high resistivity even after anneal at temperatures up to 700°C.

Original languageEnglish (US)
Pages (from-to)3423-3425
Number of pages3
JournalJournal of Applied Physics
Volume83
Issue number6
DOIs
StatePublished - 1998
Externally publishedYes

ASJC Scopus subject areas

  • General Physics and Astronomy

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